• 2009 Sematech 6th International Symposium on Immersion Lithography Extensions
  Full-field Liquid Immersion Interference Lithography

• 2008 SPIE BACUS Photomask
  Photomask Phase Metrology Using a Young's Interferometer
  
   
• 2007 SPIE Advanced Lithography
  A Solid-state 193 nm Laser with High Spatial Coherence for sub-40 nm Interferometric Immersion Lithography
  
   
• 2007 OSA Advanced Solid-State Photonics
  Efficient Non-Linear Frequency Conversion to 193 nm Using Cooled BBO
  
   
• 2005 SPIE BACUS Photomask
  Development of an Actinic Photomask Review and Phase Metrology Tool for 193-nm Lithography
  
   
• 2004 SPIE BACUS Photomask
  Development of a 5 kHz solid-state 193 nm actinic light source for photomask metrology and review
  
  High-resolution actinic imaging and phase metrology of 193 nm CPL reticles
  
   

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