Light for the Invisible World

Publications and presentations

• 2007 SPIE Advanced Lithography

             A Solid-state 193 nm Laser with High Spatial Coherence for sub-40 nm Interferometric Immersion Lithography

• 2007 OSA Advanced Solid-State Photonics

                Efficient Non-Linear Frequency Conversion to 193 nm Using Cooled BBO

• 2005 SPIE BACUS Photomask

            Development of an Actinic Photomask Review and Phase Metrology Tool for 193-nm Lithography

• 2005 International Conference on Characterization and Metrology for ULSI Technology

                Interferometric Metrology for sub-90 nm Node Phase-Shifting Photomasks

• SPIE Microlithography 2005

             Optical considerations of high-resolution photomask phase metrology

• SPIE BACUS Photomask 2004

            Development of a 5 kHz solid-state 193 nm actinic  light source for photomask metrology and review

               High-resolution actinic imaging and phase metrology of 193 nm CPL reticles