Light for the Invisible World

• Patent award for photomask metrology tool

On May 9, 2006 the US Patent and Trademark Office awarded Actinix patent number 7,042,577 for "Architectures for High-Resolution Photomask Phase Metrology." This patent covers the fundamental concept of performing extremely high resolution photomask phase measurements using pinholes that are relay imaged to the mask surface. This method is now being implemented in the PMT-193 mask metrology  tool.