Liquid immersion interference lithography (LIIL) is a powerful yet relatively low-cost approach to fabricating nano-scale grating structures on silicon wafers. Actinix is currently designing and developing the tools for large field (2 x 3 cm) patterning of gratings with half pitches down to 25 nm. (LIIL presentation)

Apr /13/2010
Actinix is awarded a DARPA Phase II STTR contract to provide a next generation light source for interference immersion lithography. The project entitled "Long Coherence Length, Far Ultraviolet Laser for High-Resolution Nano-Fabrication" will involve the development of advanced fiber lasers and non-linear optics.

Mar /22/2010
Actinix spins out new biotech start-up, CytoRay, to develop and market advanced cellular imaging and analysis tools.