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193 nm Microscope

With Phase II SBIR funding provided by the National Science Foundation, Actinix is continuing to develop the PMT-193, a photomask metrology and review tool now being targeted at the 45 nm device node. Designed primarily to characterize alternating phase shift masks, this advanced tool provides the industry’s highest resolution actinic images for mask review and defect/repair characterization, in both brightfield and darkfield illumination modes.

  

 

High resolution 193 nm bright and dark-field CPL mask images

Magnification 170X, 26 nm/pixel

Through focus dark-field high resolution CPL images

Microscope built for NSF Phase II project