Since 1999, the leader in solid-state far UV light sources and systems  for microelectronics and research.

Actinix is a research and development company specializing in far UV solid-state lasers and systems. Applications for our technology include interferometric immersion lithography, laser ablation and photomask phase metrology. Our mission is to provide our customers with the most advanced far ultraviolet lasers and optical tools that cost effectively image, measure and fabricate next generation nano-scale devices.

Company Information

Actinix has been developing solid-state 193 nm lasers since it was incorporated in 1999 in California. Our first product, Model 2193, was a low cost 10 Hz excimer alternative used for optics testing and solid sampling for commercial mass spectrometer instruments. In 2001 we received a contract from International Sematech to build a high resolution actinic 193 nm microscope and photomask transmission measurement tool. That development led eventually to NSF Phase I and Phase II SBIR awards to develop a more sophisticated 193 nm laser and a microscope for measuring the phase shift of advanced photomasks at very high resolution. In 2007 we completed a joint development with IBM in which our 5 kHz 193 nm light source was improved and then used on IBM’s NEMO interference lithography tool. That laser, now designated the Model 3193, is currently operational at the IBM Almaden Research Center and is being used to test new photoresists and materials for interference immersion lithography. Our latest R&D effort is to develop a long coherence length, sub-200 nm laser for the low volume manufacturing of integrated circuits using an interference immersion lithography tool, an effort supported through a DARPA STTR contract.

1800 Green Hills Road Suite 105 Scotts Valley, CA 95066